{"created":"2023-05-15T11:42:28.007041+00:00","id":61,"links":{},"metadata":{"_buckets":{"deposit":"c9119bcd-3e79-41a7-93f9-67bbee912ccd"},"_deposit":{"created_by":10,"id":"61","owners":[10],"pid":{"revision_id":0,"type":"depid","value":"61"},"status":"published"},"_oai":{"id":"oai:nuis.repo.nii.ac.jp:00000061","sets":["6"]},"author_link":["191","187","188","190","189","192"],"item_10001_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2013-05","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"5","bibliographicPageEnd":"1898","bibliographicPageStart":"1889","bibliographicVolumeNumber":"9","bibliographic_titles":[{"bibliographic_title":"International Journal of Innovative Computing, Information & Control : IJICIC"},{"bibliographic_title":"International Journal of Innovative Computing, Information & Control : IJICIC","bibliographic_titleLang":"en"}]}]},"item_10001_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"This paper proposes a mathematical model that is derived from bilinear partial differential equations (BPDs) in order to configure a control system including the external heat equipment (EHE) proposed in Part1. It is widely recognized that the mathematical model of the heat exchange unit has been reported. The target control system can be configured using the control parameter of the overall heat exchange coefficient (OHEC), which is given using a linear approximation from BPDs to an ordinary differential equation (ODE). The numerical simulation results are also represented for the optimal control system, and the gradient method is used in this simulation. Our findings show that this study is suitable for possible practical systems.","subitem_description_type":"Abstract"}]},"item_10001_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"ICIC International"}]},"item_10001_relation_17":{"attribute_name":"関連サイト","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"IJICIC"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"http://www.ijicic.org/","subitem_relation_type_select":"URI"}}]},"item_10001_source_id_11":{"attribute_name":"書誌レコードID（NCID）","attribute_value_mlt":[{"subitem_source_identifier":"AA12218449","subitem_source_identifier_type":"NCID"}]},"item_10001_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1349-4198","subitem_source_identifier_type":"ISSN"}]},"item_10001_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Shirai, Kenji"},{"creatorName":"シライ, ケンジ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{"nameIdentifier":"187","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Amano, Yoshinori"},{"creatorName":"アマノ, ヨシノリ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{"nameIdentifier":"188","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Omatu, Shigeru"},{"creatorName":"オオマツ, シゲル","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{"nameIdentifier":"189","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shirai, Kenji","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"190","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Amano, Yoshinori","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"191","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Omatu, Shigeru","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"192","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2018-02-14"}],"displaytype":"detail","filename":"g_zashir_1.49.pdf","filesize":[{"value":"394.6 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"g_zashir_1.49.pdf","url":"https://nuis.repo.nii.ac.jp/record/61/files/g_zashir_1.49.pdf"},"version_id":"c1f139ab-f270-4415-86ff-07078df64ae3"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Semiconductor manufacturing equipment","subitem_subject_scheme":"Other"},{"subitem_subject":"Thermal reaction process","subitem_subject_scheme":"Other"},{"subitem_subject":"Bilinear partial differential equation","subitem_subject_scheme":"Other"},{"subitem_subject":"Distributed parameter system","subitem_subject_scheme":"Other"},{"subitem_subject":"Semiconductor manufacturing equipment","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Thermal reaction process","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Bilinear partial differential equation","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Distributed parameter system","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"MATHEMATICAL MODEL OF THERMAL REACTION PROCESS FOR EXTERNAL HEATING EQUIPMENT IN THE MANUFACTURE OF SEMICONDUCTORS (PART II)","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"MATHEMATICAL MODEL OF THERMAL REACTION PROCESS FOR EXTERNAL HEATING EQUIPMENT IN THE MANUFACTURE OF SEMICONDUCTORS (PART II)"},{"subitem_title":"MATHEMATICAL MODEL OF THERMAL REACTION PROCESS FOR EXTERNAL HEATING EQUIPMENT IN THE MANUFACTURE OF SEMICONDUCTORS (PART II)","subitem_title_language":"en"}]},"item_type_id":"10001","owner":"10","path":["6"],"pubdate":{"attribute_name":"公開日","attribute_value":"2013-05-16"},"publish_date":"2013-05-16","publish_status":"0","recid":"61","relation_version_is_last":true,"title":["MATHEMATICAL MODEL OF THERMAL REACTION PROCESS FOR EXTERNAL HEATING EQUIPMENT IN THE MANUFACTURE OF SEMICONDUCTORS (PART II)"],"weko_creator_id":"10","weko_shared_id":-1},"updated":"2024-05-14T03:41:17.991423+00:00"}